The BoronPlus sources are cleaned of processing contaminants before shipping. If additional cleaning is desired, the procedures outlined in Table II should be followed.
Table II
CLEANING PROCEDURES
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BoronPlus GS126, GS139 and GS245
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Alternate for BoronPlus GS139, GS245
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The GS 126 sources should not be cleaned in any acid, and no BoronPlus sources should come in contact with HF or HCI at any time.
Consult your plant safety office or the chemical manufacturer for information on the safe handling of any cleaning agents or other materials referred to above.
Preparation: The sources should be held at the intended deposition temperature before they are used to be sure all moisture has been removed. Although some processors begin immediately to use the sources after this initial drying period, others prefer to hold the sources at the use temperature for an additional time until a more constant B2O3 evolution rate occurs. The recommended minimum aging times can be obtained from Figure 8.
Storage: Since the B2O3 is contained within the source and not totally on its surface, the BoronPlus sources exhibit a minimum amount of water absorption. However, since absorption of even small amounts of moisture can cause problems in silicon processing, we recommend they be stored in diffusion boats in a dry environment at an elevated temperature. The best procedure is to hold the sources in the hot zone of the diffusion furnace at 600oC in dry nitrogen.
BoronPlus® is a registered trademark of Techneglas Inc.
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