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Dopant sources are used in all applications
where dopant is required. Below is a partial list of the technologies
which use Techneglas’ sources:
Analog |
ASIC |
BIMOS |
Biploar |
CMOS |
Diode IC |
IGBT |
LCD's |
MEMS |
Micromachine |
Mixed Signal |
MOSFET |
Optoelectronics |
Photovoltaic |
Pressure Sensors |
Printer Nozzles |
Power Transistor |
Rectifier |
Sensors |
Solar Cells |
Thyristor |
Semiconductors use many terms for the
process levels to fabricate the electric parts of the circuits.
The following levels are just a sample of the process names
used with Techneglas’ dopant sources:
Backside Gettering |
Base |
Capacitor |
Collector |
Channel |
Channel Stop |
Emitter |
Enhancement |
Isolation |
Guards Rings |
N+ |
P+ |
Poly |
Polysilicon |
Poly Gates |
Resistor |
Sinker |
Source/Drain |
Trench Structures |
Well |
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